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Proceedings Paper

Progress on glass ceramic ZERODUR enabling nanometer precision
Author(s): Ralf Jedamzik; Clemens Kunisch; Johannes Nieder; Peter Weber; Thomas Westerhoff
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Paper Abstract

The Semiconductor Industry is making continuous progress in shrinking feature size developing technologies and process to achieve < 10 nm feature size. The required Overlay specification for successful production is in the range one nanometer or even smaller. Consequently, materials designed into metrology systems of exposure or inspection tools need to fulfill ever tighter specification on the coefficient of thermal expansion (CTE). The glass ceramic ZERODUR® is a well-established material in critical components of microlithography wafer stepper and offered with an extremely low coefficient of thermal expansion, the tightest tolerance available on market. SCHOTT is continuously improving manufacturing processes and it’s method to measure and characterize the CTE behavior of ZERODUR®. This paper is focusing on the "Advanced Dilatometer" for determination of the CTE developed at SCHOTT in the recent years and introduced into production in Q1 2015. The achievement for improving the absolute CTE measurement accuracy and the reproducibility are described in detail. Those achievements are compared to the CTE measurement accuracy reported by the Physikalische Technische Bundesanstalt (PTB), the National Metrology Institute of Germany. The CTE homogeneity is of highest importance to achieve nanometer precision on larger scales. Additionally, the paper presents data on the short scale CTE homogeneity and its improvement in the last two years. The data presented in this paper will explain the capability of ZERODUR® to enable the extreme precision required for future generation of lithography equipment and processes.

Paper Details

Date Published: 15 March 2016
PDF: 11 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97801K (15 March 2016); doi: 10.1117/12.2219629
Show Author Affiliations
Ralf Jedamzik, SCHOTT AG (Germany)
Clemens Kunisch, SCHOTT AG (Germany)
Johannes Nieder, SCHOTT AG (Germany)
Peter Weber, SCHOTT AG (Germany)
Thomas Westerhoff, SCHOTT AG (Germany)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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