Pixelated wiregrids are of great interest in polarimetric imagers, but there are no straightforward methods available for combining the uniform exposures of laser interference with a masking system to achieve pixels at different rotational angles. In this work we demonstrate a 266nm deep-UV interference lithography combined with a traditional i-line contact lithography to create such pixels. Aluminum wiregrids are first made, following by etching to create the pixels, and then a planarizing molybdenum film is used before patterning subsequent pixel arrays. The etch contrast between the molybdenum and the aluminum enables the release of the planarizing layer.

Date Published: 1 April 2016
PDF: 6 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771N (1 April 2016); doi: 10.1117/12.2219484

Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)