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Proceedings Paper

Design and fabrication of electrostatic microcolumn in multiple electron-beam lithography
Author(s): Zhidong Du; Ye Wen; Luis Traverso; Anurup Datta; Chen Chen; Xianfan Xu; Liang Pan
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Paper Abstract

Microcolumns are widely used for parallel electron-beam lithography because of their compactness and the ability to achieve high spatial resolution. A design of an electrostatic microcolumn for our recent nanoscale photoemission sources is presented. We proposed a compact column structure (as short as several microns in length) for the ease of microcolumn fabrication and lithography operation. We numerically studied the influence of several design parameters on the optical performance such as microcolumn diameter, electrode thickness, beam current, working voltages, and working distance. We also examined the effect of fringing field between adjacent microcolumns during parallel lithography operations. The microcolumns were also fabricated to show the possibility.

Paper Details

Date Published: 22 March 2016
PDF: 13 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97771D (22 March 2016); doi: 10.1117/12.2219218
Show Author Affiliations
Zhidong Du, Purdue Univ. (United States)
Ye Wen, Purdue Univ. (United States)
Luis Traverso, Purdue Univ. (United States)
Anurup Datta, Purdue Univ. (United States)
Chen Chen, Purdue Univ. (United States)
Xianfan Xu, Purdue Univ. (United States)
Liang Pan, Purdue Univ. (United States)

Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

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