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Proceedings Paper

Directed self-assembly aware restricted design rule and its impact on design ability
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Paper Abstract

Directed self-assembly (DSA), the epitaxial alignment of block copolymers to minimize the system free energy, is prone to defects that are random and difficult to eliminate. When creating fins for FinFET devices, the defect density is known to be a strong function of guide pattern CD. We propose the use of a restricted design rule (RDR) that limits the guide pattern CD to achieve low defectivity, and also report its impact on overall chip area and design-ability of logic, analog IO, and SRAM. The restricted design rule in defining guide pattern CD is extracted from empirical data. Design rule check (DRC) is applied to GLOBALFOUNDRIES' technology chip design to estimate the penalty of DSA RDR on fin layer.

Paper Details

Date Published: 16 March 2016
PDF: 8 pages
Proc. SPIE 9781, Design-Process-Technology Co-optimization for Manufacturability X, 978104 (16 March 2016); doi: 10.1117/12.2219216
Show Author Affiliations
Yulu Chen, GLOBALFOUNDRIES Inc. (United States)
Ryoung-han Kim, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 9781:
Design-Process-Technology Co-optimization for Manufacturability X
Luigi Capodieci, Editor(s)

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