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Proceedings Paper

Improved Ru/Si multilayer reflective coatings for advanced extreme-ultraviolet lithography photomasks
Author(s): Obert Wood II; Keith Wong; Valentin Parks; Patrick Kearney; Julia Meyer-Ilse; Vu Luong; Vicky Philipsen; Mohammad Faheem; Yifan Liang; Ajay Kumar; Esther Chen; Corbin Bennett; Bianzhu Fu; Michael Gribelyuk; Wayne Zhao; Pawitter Mangat; Paul Van der Heide
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Paper Abstract

Extreme ultraviolet (EUV) lithography with reflective photomasks continues to be a potential patterning technology for high volume manufacturing at the 7 nm technology node and beyond. EUV photomasks with alternative materials to the commonly used Mo/Si multilayer (ML) reflector and patterned Ta-based absorber (both of which are known to require shadow effect corrections and lead to large through-focus pattern placement errors) are being actively explored. Because the reflective bandwidth of a Ru/Si ML is significantly wider than the reflective bandwidth of a Mo/Si ML and the effective reflectance plane in Ru/Si is closer to the ML surface, Ru/Si ML coatings may be viable alternatives to the Mo/Si ML coatings that are commercially available today because they will lead to smaller mask 3D effects. In this paper, increases in the peak reflectivity and the reflective bandwidth of Ru/Si ML reflectors by using B4C interlayers to improve the Ru-Si interfaces are discussed. The conclusions of this paper are supported with the results of both experimental measurements and rigorous simulations.

Paper Details

Date Published: 18 March 2016
PDF: 10 pages
Proc. SPIE 9776, Extreme Ultraviolet (EUV) Lithography VII, 977619 (18 March 2016); doi: 10.1117/12.2219215
Show Author Affiliations
Obert Wood II, GLOBALFOUNDRIES Inc. (United States)
Keith Wong, GLOBALFOUNDRIES Inc. (United States)
Valentin Parks, GLOBALFOUNDRIES Inc. (United States)
Patrick Kearney, SEMATECH Inc. (United States)
Julia Meyer-Ilse, Lawrence Berkeley National Lab. (United States)
Vu Luong, IMEC (Belgium)
Vicky Philipsen, IMEC (Belgium)
Mohammad Faheem, GLOBALFOUNDRIES Inc. (United States)
Yifan Liang, GLOBALFOUNDRIES Inc. (United States)
Ajay Kumar, GLOBALFOUNDRIES Inc. (United States)
Esther Chen, GLOBALFOUNDRIES Inc. (United States)
Corbin Bennett, GLOBALFOUNDRIES Inc. (United States)
Bianzhu Fu, GLOBALFOUNDRIES Inc. (United States)
Michael Gribelyuk, GLOBALFOUNDRIES Inc. (United States)
Wayne Zhao, GLOBALFOUNDRIES Inc. (United States)
Pawitter Mangat, GLOBALFOUNDRIES Inc. (United States)
Paul Van der Heide, GLOBALFOUNDRIES Inc. (United States)

Published in SPIE Proceedings Vol. 9776:
Extreme Ultraviolet (EUV) Lithography VII
Eric M. Panning, Editor(s)

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