Proceedings Paper
Next-generation immersion scanner optimizing on-product performance for 7nm node| Format | Member Price | Non-Member Price |
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Paper Abstract
The semiconductor technology roadmap suggests that multiple patterning techniques will be used at the 7nm node. The final lithography accuracy is determined by what is known as the "on-product" performance, which includes projection lens heating, illumination condition variations, product wafer related errors, and long term stability. It is evident that on product performance improvement is imperative now, and will become even more crucial in coming years. Nikon has developed the next-generation lithography system focusing on optimizing the main factors impacting on product performance. In this paper, we will introduce the details of the next-generation Nikon scanner and provide supporting performance data.
Paper Details
Date Published: 15 March 2016
PDF: 10 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 978012 (15 March 2016); doi: 10.1117/12.2218955
Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)
PDF: 10 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 978012 (15 March 2016); doi: 10.1117/12.2218955
Show Author Affiliations
Yasushi Yoda, Nikon Corp. (Japan)
Akira Hayakawa, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)
Issei Fujimoto, Nikon Corp. (Japan)
Akira Hayakawa, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Yasuhiro Ohmura, Nikon Corp. (Japan)
Issei Fujimoto, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Yuji Shiba, Nikon Corp. (Japan)
Kazuo Masaki, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)
Yuji Shiba, Nikon Corp. (Japan)
Kazuo Masaki, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)
Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)
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