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Proceedings Paper

Measurement of asymmetric side wall angles by coherent scanning Fourier scatterometry
Author(s): M. L. Gödecke; S. Peterhänsel; K. Frenner; W. Osten
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Paper Abstract

We propose a measurement technique which enables the precise determination of side wall angles (SWAs) with absolute values below 1°. Our simulations show that a differentiation between asymmetric SWAs is also possible. The grating structure under investigation has a grating period on the order of a few micrometers. Each grating line consists of a fine sub-grating with 40 nm period and 20 nm critical dimension. Our approach is based on coherent high-NA Fourier scatterometry, extended by a lateral scan over the sample. Additionally, a 180°-shearing element allows for coherent superposition of the higher diffraction orders.

Paper Details

Date Published: 7 April 2016
PDF: 7 pages
Proc. SPIE 9778, Metrology, Inspection, and Process Control for Microlithography XXX, 97780G (7 April 2016); doi: 10.1117/12.2218824
Show Author Affiliations
M. L. Gödecke, Univ. of Stuttgart (Germany)
S. Peterhänsel, Univ. of Stuttgart (Germany)
K. Frenner, Univ. of Stuttgart (Germany)
W. Osten, Univ. of Stuttgart (Germany)

Published in SPIE Proceedings Vol. 9778:
Metrology, Inspection, and Process Control for Microlithography XXX
Martha I. Sanchez, Editor(s)

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