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Proceedings Paper

Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)
Author(s): Yannick Bourgin; Daniel Voigt; Thomas Käsebier; Ernst-Bernhard Kley; Uwe D. Zeitner
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Paper Abstract

Diffractive mask-aligner lithography allows printing sub-micrometer resolution structures by using non-contact mode. For such a purpose, binary diffraction gratings are used as masks and are designed to transmit solely the ±1st diffraction orders. The high resolution interferogram is realized by the overlapping and the interference of the propagating beams. By applying the techniques known as Self-Aligned Double Patterning (SADP), it´s possible to decrease the period of the fabricated grating (350 nm) by a factor of two, and thus reaching the 90nm structure width. As application, metallic gratings have been fabricated operating as wire grid polarizer (WGP).

Paper Details

Date Published: 15 March 2016
PDF: 7 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 978014 (15 March 2016); doi: 10.1117/12.2218610
Show Author Affiliations
Yannick Bourgin, Friedrich-Schiller-Univ. Jena (Germany)
Daniel Voigt, Friedrich-Schiller-Univ. Jena (Germany)
Thomas Käsebier, Friedrich-Schiller-Univ. Jena (Germany)
Ernst-Bernhard Kley, Friedrich-Schiller-Univ. Jena (Germany)
Uwe D. Zeitner, Friedrich-Schiller-Univ Jena (Germany)
Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

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