Share Email Print

Proceedings Paper

Prediction of positioning error in EB lithography
Author(s): Masaki Kimura; Kazuo Goda
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper is about positioning error of photomask by resist charge up effect in the EB lithography. We postulated that charges created by incident electron beam in the photomask form electric dipoles perpendicular to its surface by the electron image effect from metal film. The formed electric dipole distributions depending on writing patterns deflect the orbit of the electron beam . We have simulated the deflection of the electron beam by the dipole produced at the surface and obtained the dipole distribution that led to the experimentally measured position error for a test writing pattern. Our model will be useful to predict the positioning error in EB lithography.

Paper Details

Date Published: 22 March 2016
PDF: 9 pages
Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 977717 (22 March 2016); doi: 10.1117/12.2218252
Show Author Affiliations
Masaki Kimura, Meisei Univ. (Japan)
Kazuo Goda, Meisei Univ. (Japan)

Published in SPIE Proceedings Vol. 9777:
Alternative Lithographic Technologies VIII
Christopher Bencher, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?