Share Email Print

Proceedings Paper

Firefly: an optical lithographic system for the fabrication of holographic security labels
Author(s): Jorge Calderón; Oscar Rincón; Ricardo Amézquita; Iván Pulido; Sebastián Amézquita; Andrés Bernal; Luis Romero; Viviana Agudelo
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

This paper introduces Firefly, an optical lithography origination system that has been developed to produce holographic masters of high quality. This mask-less lithography system has a resolution of 418 nm half-pitch, and generates holographic masters with the optical characteristics required for security applications of level 1 (visual verification), level 2 (pocket reader verification) and level 3 (forensic verification). The holographic master constitutes the main core of the manufacturing process of security holographic labels used for the authentication of products and documents worldwide. Additionally, the Firefly is equipped with a software tool that allows for the hologram design from graphic formats stored in bitmaps. The software is capable of generating and configuring basic optical effects such as animation and color, as well as effects of high complexity such as Fresnel lenses, engraves and encrypted images, among others. The Firefly technology gathers together optical lithography, digital image processing and the most advanced control systems, making possible a competitive equipment that challenges the best technologies in the industry of holographic generation around the world. In this paper, a general description of the origination system is provided as well as some examples of its capabilities.

Paper Details

Date Published: 15 March 2016
PDF: 7 pages
Proc. SPIE 9780, Optical Microlithography XXIX, 97800U (15 March 2016); doi: 10.1117/12.2218019
Show Author Affiliations
Jorge Calderón, Combustión Ingenieros S.A.S (Colombia)
Univ. Nacional de Colombia (Colombia)
Oscar Rincón, Univ. Nacional de Colombia (Colombia)
Ricardo Amézquita, Combustión Ingenieros S.A.S (Colombia)
Univ. Nacional de Colombia (Colombia)
Iván Pulido, Combustión Ingenieros S.A.S (Colombia)
Univ. Nacional de Colombia (Colombia)
Sebastián Amézquita, Combustión Ingenieros S.A.S (Colombia)
Univ. Nacional de Colombia (Colombia)
Andrés Bernal, Combustión Ingenieros S.A.S (Colombia)
Luis Romero, Combustión Ingenieros S.A.S (Colombia)
Viviana Agudelo, Combustión Ingenieros S.A.S (Colombia)

Published in SPIE Proceedings Vol. 9780:
Optical Microlithography XXIX
Andreas Erdmann; Jongwook Kye, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?