Share Email Print

Proceedings Paper

White-light spacial frequency multiplication using soft xrays
Author(s): Max Wei; Eric M. Gullikson; James H. Underwood; T. Kenneth Gustafson; David T. Attwood Jr.
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

We have patterned a 0.25-micron period grating in SAL-601 photoresist using soft x-ray white-light spatial frequency multiplication. The configuration is that of a grating interferometer using two transmission gratings having the same period ((Lambda) equals 0.5 micron) and fabricated by electron beam lithography and lift-off. The first transmission grating splits an incoming x-ray beam into two paths and the second grating, operating in higher order, combines the two beams. A standing wave pattern is obtained at the intersection of the two beams and recorded by a photoresist coated substrate. This patterning technique has the advantage of multiplying the spatial frequency of the interferometer gratings by an even integer factor. Furthermore, the recording geometry is insensitive to both the longitudinal and transverse coherence of the illumination. Synchrotron bending magnet radiation from the advanced light source located at the Lawrence Berkeley National Laboratory was used as the source. The grating interferometer geometry has been used in the past to record white-light interference fringes using visible and ultraviolet light sources. We have used a two-grating interferometer to provide an initial demonstration of white-light spatial frequency doubling at soft x-ray wavelengths. By using this technique with shorter period parent gratings, it should be possible to patten gratings with higher resolution than electron beam lithography.

Paper Details

Date Published: 25 September 1995
PDF: 7 pages
Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221679
Show Author Affiliations
Max Wei, Lawrence Berkeley National Lab. (United States)
Eric M. Gullikson, Lawrence Berkeley National Lab. (United States)
James H. Underwood, Lawrence Berkeley National Lab. (United States)
T. Kenneth Gustafson, Lawrence Berkeley National Lab. (United States)
David T. Attwood Jr., Lawrence Berkeley National Lab. (United States)

Published in SPIE Proceedings Vol. 2516:
X-Ray Microbeam Technology and Applications
Wenbing Yun, Editor(s)

© SPIE. Terms of Use
Back to Top