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Proceedings Paper

Microfocusing optics for hard xrays fabricated by x-ray lithography
Author(s): Azalia A. Krasnoperova; Zheng Chen; Franco Cerrina; Enzo M. Di Fabrizio; Massimo Gentili; Wenbing Yun; Barry P. Lai; Efim S. Gluskin
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Paper Abstract

Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.

Paper Details

Date Published: 25 September 1995
PDF: 12 pages
Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221670
Show Author Affiliations
Azalia A. Krasnoperova, Univ. of Wisconsin/Madison (United States)
Zheng Chen, Univ. of Wisconsin/Madison (United States)
Franco Cerrina, Univ. of Wisconsin/Madison (United States)
Enzo M. Di Fabrizio, Institute of Solid State Technology (Italy)
Massimo Gentili, Institute of Solid State Technology (Italy)
Wenbing Yun, Argonne National Lab. (United States)
Barry P. Lai, Argonne National Lab. (United States)
Efim S. Gluskin, Argonne National Lab. (United States)

Published in SPIE Proceedings Vol. 2516:
X-Ray Microbeam Technology and Applications
Wenbing Yun, Editor(s)

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