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Proceedings Paper

Stigmatic high-resolution high-throughput XUV spectroscopic instruments employing unconventional optical components
Author(s): Eugene N. Ragozin; Nikolai N. Kolachevsky; Mikhail M. Mitropolsky; Yurii Yu. Pokrovsky; Anatoli I. Fedorenko; V. V. Kondratenko; S. A. Yulin
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Paper Abstract

We have implemented a variety of stigmatic high-throughput high-resolution spectroscopic configurations in the XUV using focusing multilayer mirrors (MMs), transmission gratings (TGs), and conventional plane reflection gratings. A Type-I 1-m-long spectrograph, which comprises a couple of identical MMs with reflection peaks centered at 180 angstrom and a 1800 line/mm blazed grating operating in the second outside spectral order, has a residual astigmatism of 16 microns, a plate scale of 0.35 Angstrom/mm, a bandwidth of approximately 15 angstrom (FWHM), and a resolution of 24,000 (demonstrated). The solid angle of acceptance is a square which measures 0.03 rad multiplied by 0.015 rad. A density-dependent Stark shift of the 2p43s levels of Mg IV was observed in a laser plasma. A Type-II highly versatile spectrometer, which comprises one focusing MM and a TG used to disperse a converging beam, offers a high throughput and a moderate dispersion, with a plate scale typically in the range 5 - 50 angstrom/mm. With respect to these applications, a number of Mo-Si MMs were synthesized on fused silica substrates (r equals 2000 mm, D equals 60 mm). In combination with a point-like laser-plasma broadband radiation source, the Type-II configuration is by itself inherently suited for spectroscopic characterization of imaging MMs. Our capacity to evaluate the spectral response of MMs has improved dramatically after invoking a 5-cm2-aperture TG with a density of about 1000 lines/mm initially intended for x-ray astronomy. Stigmatic line spectra in a range of 165 - 185 angstrom were obtained in the Type-II configuration, and a resolution of 500 was demonstrated.

Paper Details

Date Published: 25 September 1995
PDF: 12 pages
Proc. SPIE 2520, Soft X-Ray Lasers and Applications, (25 September 1995); doi: 10.1117/12.221645
Show Author Affiliations
Eugene N. Ragozin, P.N. Lebedev Physical Institute (Russia)
Nikolai N. Kolachevsky, P.N. Lebedev Physical Institute (Russia)
Mikhail M. Mitropolsky, P.N. Lebedev Physical Institute (Russia)
Yurii Yu. Pokrovsky, P.N. Lebedev Physical Institute (Russia)
Anatoli I. Fedorenko, Khar'kov Polytechnical Institute (Ukraine)
V. V. Kondratenko, Khar'kov Polytechnical Institute (Ukraine)
S. A. Yulin, Khar'kov Polytechnical Institute (Ukraine)

Published in SPIE Proceedings Vol. 2520:
Soft X-Ray Lasers and Applications
Jorge J. G. Rocca; Peter L. Hagelstein, Editor(s)

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