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Proceedings Paper

Improvement of sensitivity and depth resolution in conventional RBS and ERDA techniques using energy/momentum filters
Author(s): Kiyotaka Ishibashi; Yukito Furukawa; Kazushi Yokoyama; Ken-ichi Inoue; Bijoy K. Patnaik; Nalin R. Parikh
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Paper Abstract

Applications of electric and/or magnetic filters to Rutherford backscattering (RBS) and elastic recoil detection analysis (ERDA) were studied with the aim of improving their performance such as detection limit and depth resolution. A novel RBS technique combined with a charged particle energy filter (CPEF) has been proposed for the detection of contaminants on Si wafers. The CPEF is an electric deflector of charged particles. In this technique, it is placed between a sample and a detector and plays the role of filtering undesirable backscattered signals originated in silicon atoms in the sample from contaminant signals. Experimental results have shown that the CPEF can suppress the silicon signals selectively and appreciably. Another study has been done for ERDA technique using a charge particle energy filter (CPMF) for the analysis of hydrogen depth profile on the surface of a sample. The CPMF is a magnetic deflector of charged particle. It works to remove high energy backscattered particles. As a result, the thickness of the foil in front of a detector can be thinner. The results of calculation have shown that the thickness can be reduced by around 40%.

Paper Details

Date Published: 25 September 1995
PDF: 9 pages
Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995);
Show Author Affiliations
Kiyotaka Ishibashi, Kobe Steel, Ltd. (Japan)
Yukito Furukawa, Kobe Steel, Ltd. (Japan)
Kazushi Yokoyama, Kobe Steel, Ltd. (Japan)
Ken-ichi Inoue, Kobe Steel, Ltd. (Japan)
Bijoy K. Patnaik, Univ. of North Carolina/Chapel Hill (United States)
Nalin R. Parikh, Univ. of North Carolina/Chapel Hill (United States)

Published in SPIE Proceedings Vol. 2522:
Electron-Beam Sources and Charged-Particle Optics
Eric Munro; Henry P. Freund, Editor(s)

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