Share Email Print

Proceedings Paper

Photochemical reduction of graphene oxide (GO) by femtosecond laser irradiation
Author(s): Muttaqin; Takahiro Nakamura; Shunichi Sato
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

In this study, we demonstrated a facile method for the reduction of graphene oxide (GO) by applying femtosecond laser pulse irradiation in aqueous colloidal solution. Utilization of femtosecond (fs) laser pulse irradiation enabled us to control GO reduction by adjusting laser fluence and irradiation time. The formation of reduced graphene oxide (rGO) was induced by solvated electrons generated through laser irradiation of colloidal GO solution, which was confirmed by means of UV-visible and Raman spectroscopy, XPS and XRD. By applying an optimum femtosecond laser condition, the interplanar spacing between carbon layers decreased significantly from 9.81 Å to 3.52Å indicating the effective removal of oxygen-containing groups from the basal plane of GO. Furthermore, the sheet resistivity of the fabricated rGO in disk form was 1,200 times lower than GO.

Paper Details

Date Published: 4 March 2016
PDF: 8 pages
Proc. SPIE 9736, Laser-based Micro- and Nanoprocessing X, 973617 (4 March 2016); doi: 10.1117/12.2211583
Show Author Affiliations
Muttaqin, Tohoku Univ. (Japan)
Takahiro Nakamura, Tohoku Univ. (Japan)
Shunichi Sato, Tohoku Univ. (Japan)

Published in SPIE Proceedings Vol. 9736:
Laser-based Micro- and Nanoprocessing X
Udo Klotzbach; Kunihiko Washio; Craig B. Arnold, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?