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Proceedings Paper

High-power excimer laser-generated plasma source for x-ray microlithography
Author(s): Harry Shields; Michael F. Powers; I. C. Edmond Turcu; Ian N. Ross; Juan R. Maldonado; Philip G. Burkhalter; D. A. Newman
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Paper Abstract

This paper describes a high-intensity, high pulse-repetition-rate picosecond-pulse excimer laser system and plasma x-ray source, which generates up to 3 W of average x-ray power, into 2(pi) steradians, in a spectral band from 10-16 angstrom. The XeCl excimer laser system output, at 308 nm, consists of a train of 16 pulses, each approximately 45 ps in duration and spaced by 2 ns. The energy of each pulse in the train is approximately 25 mJ, and the pulse-train repetition rate is 60 Hz. Each pulse in the train is focused to a spot of < 10 micrometers diameter on a metal tape target, resulting in an intensity of 1 X 1015 W cm-2. Spectral and spatial characteristics of the x-ray emission have been studied, and the laser energy to x-ray dose conversion efficiency has been measured in an experiment which simulates the x-ray lithography process. Lithographic efficiencies of 5.9% and 10.9% have been measured for copper and stainless steel targets, respectively.

Paper Details

Date Published: 18 September 1995
PDF: 7 pages
Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220972
Show Author Affiliations
Harry Shields, JMAR Technology Co. (United States)
Michael F. Powers, JMAR Technology Co. (United States)
I. C. Edmond Turcu, Rutherford Appleton Lab. (United States)
Ian N. Ross, Rutherford Appleton Lab. (United Kingdom)
Juan R. Maldonado, IBM Microelectronics (United States)
Philip G. Burkhalter, Naval Research Lab. (United States)
D. A. Newman, SFA, Inc. (United States)

Published in SPIE Proceedings Vol. 2523:
Applications of Laser Plasma Radiation II
Martin C. Richardson; George A. Kyrala, Editor(s)

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