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Proceedings Paper

3D micro profile measurement with the method of spatial frequency domain analysis
Author(s): Yongxiang Xu
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Paper Abstract

3D micro profiles are often needed for measurement in many fields, e.g., binary optics, electronic industry, mechanical manufacturing, aeronautic and space industry, etc. In the case where height difference between two neighboring points of a test profile is equal to or greater than λ / 4, microscopic interferometry based on laser source will no longer be applicable because of the uncertainty in phase unwrapping. As white light possesses the characteristic of interference length approximate to zero, applying it for micro profilometry can avoid the trouble and can yield accurate results. Using self-developed Mirau-type scanning interference microscope, a step-like sample was tested twice, with 128 scanning interferograms recorded for each test. To process each set of the interferograms, the method of spatial frequency domain analysis was adopted. That is, for each point, by use of Furrier transform, white-light interference intensities were decomposed in spatial frequency domain, thus obtaining phase values corresponding to different wavenumbers; by using least square fitting on phases and wave numbers, a group-velocity OPD was gained for the very point; and finally in terms of the relation between relative height and the group-velocity OPD, the profile of the test sample was obtained. Two tests yielded same profile result for the sample, and step heights obtained were 50.88 nm and 50.94 nm, respectively. Meantime, the sample was also measured with a Zygo Newview 7200 topography instrument, with same profile result obtained and step height differing by 0.9 nm. In addition, data processing results indicate that chromatic dispersion equal to and higher than 2nd order is negligible when applying spatial frequency domain analysis method.

Paper Details

Date Published: 8 October 2015
PDF: 6 pages
Proc. SPIE 9677, AOPC 2015: Optical Test, Measurement, and Equipment, 96772L (8 October 2015); doi: 10.1117/12.2202973
Show Author Affiliations
Yongxiang Xu, Nanjing Univ. of Science and Technology (China)

Published in SPIE Proceedings Vol. 9677:
AOPC 2015: Optical Test, Measurement, and Equipment
Sen Han; Jonathan D. Ellis; Junpeng Guo; Yongcai Guo, Editor(s)

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