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Proceedings Paper

Control of surface ablation on fused silica with ultrafast laser double-pulse based on seed electrons dynamics control
Author(s): K. H. Zhang; X. Li; W. L. Rong; P. Ran; B. Li; P. Feng; Q. Q. Yang
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Paper Abstract

The influence of pulse-separation (τs) between a pair of temporally separated femtosecond laser pulses (with near ablation-threshold energy) on surface ablation of SiO2 were experimentally studied. A τs range of τs≤20 ps was considered. It was shown that a τs-independent/-dependent crater ablation area can be flexibly controlled. Once the pulse energy of the pulse pair exceeds a threshold value, crater ablation area become quasi-τs-independent at τs> ~1 ps. This τs-independent phenomenon can even be observed when each pulse within the double-pulse pair has a sub-threshold energy, which leads to a further reduction in ablation size. The experimental findings have not only confirmed our previous calculation based on a modified model, but also greatly extended the results both quantitatively and qualitatively. A dominant amount of seed electron from photoionization of self-trapped excitons (STEs) is responsible for the appearance of τs-independent phenomena. For physical interest, it is inferred that destruction of STEs will tend to break the τs-independent ablation phenomena. Experiments performed on CdWO4, a material exhibiting similar electron dynamics to that in SiO2 but a faster decay in STE population, support this conjecture. A possible improvement for the relevant theoretical modeling is also suggested based on the experimental findings.

Paper Details

Date Published: 15 October 2015
PDF: 8 pages
Proc. SPIE 9673, AOPC 2015: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques, 96730Z (15 October 2015); doi: 10.1117/12.2202346
Show Author Affiliations
K. H. Zhang, Beijing Institute of Technology (China)
X. Li, Beijing Institute of Technology (China)
W. L. Rong, Beijing Institute of Technology (China)
P. Ran, Beijing Institute of Technology (China)
B. Li, Beijing Institute of Technology (China)
P. Feng, Beijing Institute of Technology (China)
Q. Q. Yang, Beijing Institute of Technology (China)

Published in SPIE Proceedings Vol. 9673:
AOPC 2015: Micro/Nano Optical Manufacturing Technologies; and Laser Processing and Rapid Prototyping Techniques
Lin Li; Minghui Hong; Lan Jiang, Editor(s)

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