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Proceedings Paper

Replication and subdivision of chromium nano-grating in atom lithography
Author(s): Xiao Deng; Jie Chen; Jie Liu; Yan Ma; Xinbin Cheng; Tongbao Li
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Paper Abstract

Atom lithography is a novel technique for nanofabrication which can be used to grow periodic arrays of highly uniform nanometer-scale structures. The pitch standard of Cr nano-grating is 212.8±0.1 nm, which coincides with λ/2 of the standing wave, in correspondence with the 52Cr atomic resonance transition: 7S37P40, λ= 425.55 nm. With the utilization of the material removal ability by AFM scratching, the Cr nanostructures have been transferred to an InP substrate for replication and subdivision. The uncertainty analysed based on gravity centre (GC) method is better than 0.5% for both replicated and subdivided nano-gratings. AFM lithography method expands the application of atom lithography in metrology to a smaller scale with high precision.

Paper Details

Date Published: 24 September 2015
PDF: 6 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96281O (24 September 2015); doi: 10.1117/12.2191128
Show Author Affiliations
Xiao Deng, Tongji Univ. (China)
Jie Chen, Tongji Univ. (China)
Jie Liu, Tongji Univ. (China)
Yan Ma, Tongji Univ. (China)
Xinbin Cheng, Tongji Univ. (China)
Tongbao Li, Tongji Univ. (China)

Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)

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