In the optics industry thin film systems are used to construct various interference devices such as antireflective coatings, high-reflectance mirrors, beam splitters and filters. The optical characterization of complex optical systems can not be performed by measurements only in the short spectral range in which the interference devices will be employed because the measured data do not contain sufficient information about all relevant parameters of these systems. The characterization of film materials requires the extension of the spectral range of the measurements to the IR region containing phonon absorption and to the UV region containing the electronic excitations. However, this leads to necessity of a dispersion model suitable for the description of the dielectric response in the wide spectral range. Such model must respect the physical conditions following from theory of dispersion, particularly Kramers-Kronig relations and integrability imposed by sum rules. This work presents the construction of a universal dispersion model composed from individual contributions representing both electronic and phonon excitations. The efficiency of presented model is given by the fact that all the contributions are described by analytical expressions. It is shown that the model is suitable for precise modeling of spectral dependencies of optical constants of a broad class of materials used in the optical industry for thin film systems such as MgF₂, SiO₂, Al₂O₃, HfO₂, Ta₂O₅ and TiO₂ in the spectral range from far IR to vacuum UV.

Date Published: 24 September 2015
PDF: 12 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 96281U (24 September 2015); doi: 10.1117/12.2190104

Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)