
Proceedings Paper
Two-dimension lateral shearing interferometry with dual-modeFormat | Member Price | Non-Member Price |
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Paper Abstract
Lateral shearing interferometry is an attractive technique to measure the wavefront aberration of high numerical aperture optical systems, of which using two-dimensional grating can divide and shear the wavefront in two-dimension simultaneously. A two-dimension lateral shearing interferometer based on chessboard grating was designed, which can work in dual-mode: the phase shifting mode and the Fourier transform mode. In the phase shifting mode, the phase shifting was realized by moving chessboard grating along the shearing direction in the image plane. In the Fourier transform mode, the spatial carrier frequency was realized by positioning the grating at the Talbot distance of the objective image plane. An experimental setup was designed to measure a 10×, NA0.25 microscope objective at 632.8nm wavelength. The objective was measured by the experimental setup in dual-mode, the results showed that the wavefront of the objective was 0.172λ RMS; in the phase shifting mode, the repeatability (3σ) of RMS was 1.1mλ; in the Fourier transform mode, the repeatability (3σ) of RMS was 2.7mλ; after correcting the coordinates of the wavefront, the differences of Z5 to Z36 between phase shifting mode and the Fourier transform mode were better than 8mλ.
Paper Details
Date Published: 24 September 2015
PDF: 9 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 962817 (24 September 2015); doi: 10.1117/12.2189878
Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)
PDF: 9 pages
Proc. SPIE 9628, Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V, 962817 (24 September 2015); doi: 10.1117/12.2189878
Show Author Affiliations
Zhixiang Liu, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Tingwen Xin, Institute of Optics and Electronics (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Tingwen Xin, Institute of Optics and Electronics (China)
Yadong Jiang, Univ. of Electronic Science and Technology of China (China)
Baobin Lv, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Fuchao Xu, Institute of Optics and Electronics (China)
Univ. of Electronic Science and Technology of China (China)
Univ. of Chinese Academy of Sciences (China)
Fuchao Xu, Institute of Optics and Electronics (China)
Published in SPIE Proceedings Vol. 9628:
Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V
Angela Duparré; Roland Geyl, Editor(s)
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