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Proceedings Paper

Photonic structures in photoresist and PDMS surface patterned by AFM lithography
Author(s): J. Ďurišová; S. Slabeyciusová; D. Pudiš; D. Jandura
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Paper Abstract

This contribution demonstrates surface modification of thin photoresist layers and polydimethylsiloxane (PDMS) surfaces with spatial resolution better than 20 nm. We provided few different 2D arrangements of surface patterning with aim to prepare 2D photonic structures with various symmetries in the thin S1828 photoresist layer using AFM lithography. Consequently, we used the imprinting technique for transferring the photoresist pattern to the PDMS membrane surface. Finally, prepared 2D photonic structures in photoresist and PDMS surfaces are characterized by AFM.

Paper Details

Date Published: 5 May 2015
PDF: 6 pages
Proc. SPIE 9502, Metamaterials X, 950211 (5 May 2015); doi: 10.1117/12.2181900
Show Author Affiliations
J. Ďurišová, Univ. of Žilina (Slovakia)
S. Slabeyciusová, Univ. of Žilina (Slovakia)
D. Pudiš, Univ. of Žilina (Slovakia)
D. Jandura, Univ. of Žilina (Slovakia)

Published in SPIE Proceedings Vol. 9502:
Metamaterials X
Vladimír Kuzmiak; Peter Markos; Tomasz Szoplik, Editor(s)

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