Share Email Print

Proceedings Paper

Monte Carlo simulation of hot electron transport in deep submicron SOI MOSFET
Author(s): A. V. Borzdov; V. M. Borzdov; V. V. V'yurkov
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

Ensemble Monte-Carlo simulation of electron and hole transport in deep submicron n-channel SOI MOSFET with 100 nm channel length is performed. The influence of interband impact ionization process on the transistor characteristics is investigated within the framework of Keldysh impact ionization model. Effective threshold energy of electron impact ionization as a parameter characterizing the process is calculated. The dependence of the effective threshold energy on the drain bias is determined.

Paper Details

Date Published: 18 December 2014
PDF: 7 pages
Proc. SPIE 9440, International Conference on Micro- and Nano-Electronics 2014, 944013 (18 December 2014); doi: 10.1117/12.2180417
Show Author Affiliations
A. V. Borzdov, Belarusian State Univ. (Belarus)
V. M. Borzdov, Belarusian State Univ. (Belarus)
V. V. V'yurkov, Institute of Physics and Technology (Russian Federation)

Published in SPIE Proceedings Vol. 9440:
International Conference on Micro- and Nano-Electronics 2014
Alexander A. Orlikovsky, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?