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Proceedings Paper

Extending green technology innovations to enable greener fabs
Author(s): Kenji Takahisa; Young Sun Yoo; Hitomi Fukuda; Yuji Minegishi; Tatsuo Enami
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Paper Abstract

Semiconductor manufacturing industry has growing concerns over future environmental impacts as fabs expand and new generations of equipment become more powerful. Especially rare gases supply and price are one of prime concerns for operation of high volume manufacturing (HVM) fabs. Over the past year it has come to our attention that Helium and Neon gas supplies could be unstable and become a threat to HVM fabs. To address these concerns, Gigaphoton has implemented various green technologies under its EcoPhoton program. One of the initiatives is GigaTwin deep ultraviolet (DUV) lithography laser design which enables highly efficient and stable operation. Under this design laser systems run with 50% less electric energy and gas consumption compared to conventional laser designs. In 2014 we have developed two technologies to further reduce electric energy and gas efficiency. The electric energy reduction technology is called eGRYCOS (enhanced Gigaphoton Recycled Chamber Operation System), and it reduces electric energy by 15% without compromising any of laser performances. eGRYCOS system has a sophisticated gas flow design so that we can reduce cross-flow-fan rotation speed. The gas reduction technology is called eTGM (enhanced Total gas Manager) and it improves gas management system optimizing the gas injection and exhaust amount based on laser performances, resulting in 50% gas savings. The next steps in our roadmap technologies are indicated and we call for potential partners to work with us based on OPEN INNOVATION concept to successfully develop faster and better solutions in all possible areas where green innovation may exist.

Paper Details

Date Published: 18 March 2015
PDF: 6 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942628 (18 March 2015); doi: 10.1117/12.2180275
Show Author Affiliations
Kenji Takahisa, Gigaphoton Inc. (Japan)
Young Sun Yoo, Gigaphoton Inc. (Japan)
Hitomi Fukuda, Gigaphoton Inc. (Japan)
Yuji Minegishi, Gigaphoton Inc. (Japan)
Tatsuo Enami, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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