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Proceedings Paper

New robust and highly customizable light source management system
Author(s): Yuji Minegishi; Kenji Takahisa; Hideyuki Ochiai; Takeshi Ohta; Tatsuo Enami
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Paper Abstract

In semiconductor lithography, light sources play a significant role in the wafer production process as well as impacting the manufacturing cost per wafer. Chip manufacturers going forward will be challenged to develop new ways to become more cost effective than their competitors, and the software tools necessary to compete in this environment must be capable of effectively adapting to the unique needs of each manufacturer. Gigaphoton has developed a new highly customizable software system for managing light sources. It not only offers a simple and intuitive user interface that can be operated using a standard web browser on PCs, tablets, and smartphones, but also a platform for users and third parties to develop unique extensions and optimizations.

Paper Details

Date Published: 18 March 2015
PDF: 8 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942627 (18 March 2015); doi: 10.1117/12.2180273
Show Author Affiliations
Yuji Minegishi, Gigaphoton Inc. (Japan)
Kenji Takahisa, Gigaphoton Inc. (Japan)
Hideyuki Ochiai, Gigaphoton Inc. (Japan)
Takeshi Ohta, Gigaphoton Inc. (Japan)
Tatsuo Enami, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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