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Proceedings Paper

Key components technology update of 100W HVM EUV source
Author(s): Taku Yamazaki; Hakaru Mizoguchi; Hiroaki Nakarai; Tamotsu Abe; Yasufumi Kawasuji; Takeshi Okamoto; Hiroshi Tanaka; Yukio Watanabe; Tsukasa Hori; Takeshi Kodama; Yutaka Shiraishi; Shinji Okazaki; Takashi Saitou
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Paper Abstract

This paper introduces key components technology update of 100 W HVM LPP-EUV (laser produced plasma extreme ultraviolet) source which enable sub-10 nm critical layer patterning. This light source system is composed of several key components and each has its innovating, key and original technology. They are perfectly controlled and work harmoniously to produce stable plasma and provide high power EUV light in long term to the photolithography equipment. This paper describes the latest results obtained from our proto systems and test stands which support one hundred watt HVM LPP-EUV light source. Key components performance with experimental data and measurements are reported, such as high power short pulse CO2 drive laser, unique pre-pulse laser technology, very small droplet generation, magnetic debris mitigation, laser-droplet shooting control and etc.

Paper Details

Date Published: 13 March 2015
PDF: 7 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94222P (13 March 2015); doi: 10.1117/12.2180269
Show Author Affiliations
Taku Yamazaki, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)
Hiroaki Nakarai, Gigaphoton Inc. (Japan)
Tamotsu Abe, Gigaphoton Inc. (Japan)
Yasufumi Kawasuji, Gigaphoton Inc. (Japan)
Takeshi Okamoto, Gigaphoton Inc. (Japan)
Hiroshi Tanaka, Gigaphoton Inc. (Japan)
Yukio Watanabe, Gigaphoton Inc. (Japan)
Tsukasa Hori, Gigaphoton Inc. (Japan)
Takeshi Kodama, Gigaphoton Inc. (Japan)
Yutaka Shiraishi, Gigaphoton Inc. (Japan)
Shinji Okazaki, Gigaphoton Inc. (Japan)
Takashi Saitou, Gigaphoton Inc. (Japan)

Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood II; Eric M. Panning, Editor(s)

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