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Proceedings Paper

ALD-tuned titanium dioxide nanophotonics
Author(s): Markus Häyrinen; Arijit Bera; Matthieu Roussey; Markku Kuittinen; Seppo Honkanen
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Paper Abstract

We demonstrate the possibilities of atomic layer deposition technology to fabricate and improve the quality of nanowaveguide devices of a different kind in TiO2 platform. In particular, we present an original re-coating method of improving the quality of amorphous TiO2 strip waveguides, which reduces the propagation losses significantly. Then we demonstrate how atomic layer deposition technology makes it possible to fabricate very precise slot waveguides and to tune the geometrical parameters of nanobeam cavities operating with visible light. The main fabrication methods of the presented structures are electron beam lithography, reactive ion etching and atomic layer deposition.

Paper Details

Date Published: 1 June 2015
PDF: 7 pages
Proc. SPIE 9519, Nanotechnology VII, 951903 (1 June 2015); doi: 10.1117/12.2178132
Show Author Affiliations
Markus Häyrinen, Univ. of Eastern Finland (Finland)
Arijit Bera, Univ. of Eastern Finland (Finland)
Matthieu Roussey, Univ. of Eastern Finland (Finland)
Markku Kuittinen, Univ. of Eastern Finland (Finland)
Seppo Honkanen, Univ. of Eastern Finland (Finland)

Published in SPIE Proceedings Vol. 9519:
Nanotechnology VII
Ion M. Tiginyanu, Editor(s)

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