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Proceedings Paper

Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixing
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Paper Abstract

The nonlinearity inherent in four-wave mixing in photorefractive (PR) materials is used for adaptive filtering. Examples include script enhancement on a periodic pattern, scratch and defect cluster enhancement, periodic pattern dislocation enhancement, etc. through intensity filtering image manipulation. Organic PR materials have large space-bandwidth product, which makes them useful in adaptive filtering techniques in quality control systems. For instance, in the case of edge enhancement, phase conjugation via four-wave mixing suppresses the low spatial frequencies of the Fourier spectrum of an aperiodic image and consequently leads to image edge enhancement. In this work, we model, numerically verify, and simulate the performance of a four wave mixing setup used for edge, defect and pattern detection in periodic amplitude and phase structures. The results show that this technique successfully detects the slightest defects clearly even with no enhancement. This technique should facilitate improvements in applications such as image display sharpness utilizing edge enhancement, production line defect inspection of fabrics, textiles, e-beam lithography masks, surface inspection, and materials characterization.

Paper Details

Date Published: 20 April 2015
PDF: 8 pages
Proc. SPIE 9477, Optical Pattern Recognition XXVI, 94770B (20 April 2015); doi: 10.1117/12.2176427
Show Author Affiliations
Georges Nehmetallah, The Catholic Univ. of America (United States)
Partha Banerjee, Univ. of Dayton (United States)
Jed Khoury, Air Force Research Lab. (United States)

Published in SPIE Proceedings Vol. 9477:
Optical Pattern Recognition XXVI
David Casasent; Mohammad S. Alam, Editor(s)

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