
Proceedings Paper
Simulation of pattern and defect detection in periodic amplitude and phase structures using photorefractive four-wave mixingFormat | Member Price | Non-Member Price |
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Paper Abstract
The nonlinearity inherent in four-wave mixing in photorefractive (PR) materials is used for adaptive filtering. Examples
include script enhancement on a periodic pattern, scratch and defect cluster enhancement, periodic pattern dislocation
enhancement, etc. through intensity filtering image manipulation. Organic PR materials have large space-bandwidth
product, which makes them useful in adaptive filtering techniques in quality control systems. For instance, in the case of
edge enhancement, phase conjugation via four-wave mixing suppresses the low spatial frequencies of the Fourier
spectrum of an aperiodic image and consequently leads to image edge enhancement. In this work, we model,
numerically verify, and simulate the performance of a four wave mixing setup used for edge, defect and pattern detection
in periodic amplitude and phase structures. The results show that this technique successfully detects the slightest defects
clearly even with no enhancement. This technique should facilitate improvements in applications such as image display
sharpness utilizing edge enhancement, production line defect inspection of fabrics, textiles, e-beam lithography masks,
surface inspection, and materials characterization.
Paper Details
Date Published: 20 April 2015
PDF: 8 pages
Proc. SPIE 9477, Optical Pattern Recognition XXVI, 94770B (20 April 2015); doi: 10.1117/12.2176427
Published in SPIE Proceedings Vol. 9477:
Optical Pattern Recognition XXVI
David Casasent; Mohammad S. Alam, Editor(s)
PDF: 8 pages
Proc. SPIE 9477, Optical Pattern Recognition XXVI, 94770B (20 April 2015); doi: 10.1117/12.2176427
Show Author Affiliations
Georges Nehmetallah, The Catholic Univ. of America (United States)
Partha Banerjee, Univ. of Dayton (United States)
Partha Banerjee, Univ. of Dayton (United States)
Jed Khoury, Air Force Research Lab. (United States)
Published in SPIE Proceedings Vol. 9477:
Optical Pattern Recognition XXVI
David Casasent; Mohammad S. Alam, Editor(s)
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