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Proceedings Paper

Electrochemical deposition and characterizations of adherent NiO porous films for photovoltaic applications
Author(s): Sana Koussi-Daoud; Thierry Pauporté
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Paper Abstract

We present the cathodic electrochemical preparation of NiO porous films on transparent conducting oxide substrates from nickel nitrate precursor. Two approaches are developed. The first one consists in depositing a precursor by pulsed deposition using an aqueous medium. The precursor layer is shown to be a mixture of nickel oxide and hydroxide. It is subsequently transformed into NiO by thermal annealing. We have also developed the direct electrodeposition of NiO porous layers using dimethyl sulfoxide (DMSO) organic medium and higher deposition temperature. The films have been sensitized by the P1 dye and tested as the hole transport layers for p-type dye-sensitized solar cells.

Paper Details

Date Published: 13 March 2015
PDF: 9 pages
Proc. SPIE 9364, Oxide-based Materials and Devices VI, 936425 (13 March 2015); doi: 10.1117/12.2175921
Show Author Affiliations
Sana Koussi-Daoud, Institut de Recherche de Chimie Paris, CNRS, Chimie ParisTech (France)
Thierry Pauporté, Institut de Recherche de Chimie Paris, CNRS, Chimie ParisTech (France)

Published in SPIE Proceedings Vol. 9364:
Oxide-based Materials and Devices VI
Ferechteh H. Teherani; David C. Look; David J. Rogers, Editor(s)

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