In this paper, capabilities of the fabrication technology for planar waveguide structures and devices in polydimethylsiloxane (PDMS) are presented. Direct laser writing in combination with imprinting technique was used to pattern photoresist layer as a master for imprinting process. In the next step, PDMS waveguide structures as channel waveguide, Y-branch waveguide splitter and ring resonator were imprinted. Finally, optical and morphological properties of prepared devices were investigated by confocal microscopy and atomic force microscopy.

Date Published: 5 December 2014
PDF: 6 pages
Proc. SPIE 9441, 19th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics, 944119 (5 December 2014); doi: 10.1117/12.2175902

Published in SPIE Proceedings Vol. 9441:
19th Polish-Slovak-Czech Optical Conference on Wave and Quantum Aspects of Contemporary Optics
Agnieszka Popiolek-Masajada; Waclaw Urbanczyk, Editor(s)