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Proceedings Paper

Electrochromic device development for large-scale applications
Author(s): Mark S. Burdis; John R. Siddle; Richard A. Batchelor; Jose M. Gallego
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Paper Abstract

This paper reviews some of the electrochromic device development carried out in our laboratories over the last few years. An initial discussion of the device material properties required and achieved, in particular some considerations concerning WO3, is given. This highlights the use of systematically optimized thin films produced by sputtering in a variety of different ways. It is found that the thin films produced for large area depositions are often not the 'best' electrochromically, but may have to be this way because of a number of deposition and production constraints. The production of a large area electrochromic device is ultimately an exercise in compromises. Consideration of the WO3 layer alone shows this to be true. Compromises must be made to determine the thin film properties, as they are all related to one another through the deposition conditions, but economic considerations must also be taken into account.

Paper Details

Date Published: 23 August 1995
PDF: 8 pages
Proc. SPIE 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV, (23 August 1995); doi: 10.1117/12.217331
Show Author Affiliations
Mark S. Burdis, Pilkington Technology Ctr. (United Kingdom)
John R. Siddle, Pilkington Technology Ctr. (United Kingdom)
Richard A. Batchelor, Pilkington Technology Ctr. (United Kingdom)
Jose M. Gallego, Pilkington Technology Ctr. (United Kingdom)

Published in SPIE Proceedings Vol. 2531:
Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV
Carl M. Lampert; Satyen K. Deb; Claes-Goeran Granqvist, Editor(s)

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