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Proceedings Paper

Low-pressure chemical vapor deposition of emissivity modification coatings on complex shapes
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Paper Abstract

Modifying the emissivity of non-planar surfaces and objects with complex geometries has proven to be a difficult task. Optical interference coatings have been successfully used to change the spectral emissivity of a surface. However, typical deposition processes for these coatings, such as evaporation, are line-of-sight processes that require complex masking and/or rotation systems in order to coat non-planar surfaces. Objects with very complex geometries cannot be coated at all by line-of-sight processes. In addition, evaporative processes often do not provide films with good resistance to thermal cycling to high temperatures. Low Pressure Chemical Vapor Deposition (LPCVD) is a non-line-of-sight process that unifonnly coats all exposed surfaces of objects with complex shapes. DSI has developed an LPCVD process that is capable of the routine manufacture of optical interference coatings. We have used this process to deposit high quality, uniform, conformal coatings for the modification of the emissivity of a variety of materials including ceramics and metals. Coatings of these substrates in very complex, non-planar forms have been demonstrated. The coatings show excellent durability and withstand repeated cycling to high temperatures. In this paper we will briefly describe the coating process, show examples of some of the substrate forms, and describe the spectral and environmental performance of these emittance control coatings.

Paper Details

Date Published: 1 October 1990
PDF: 9 pages
Proc. SPIE 1307, Electro-Optical Materials for Switches, Coatings, Sensor Optics, and Detectors, (1 October 1990); doi: 10.1117/12.21702
Show Author Affiliations
Donald Z. Rogers, Deposition Sciences, Inc. (United States)
Ric P. Shimshock, Deposition Sciences, Inc. (United States)

Published in SPIE Proceedings Vol. 1307:
Electro-Optical Materials for Switches, Coatings, Sensor Optics, and Detectors
Rudolf Hartmann; M. J. Soileau; Vijay K. Varadan, Editor(s)

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