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Proceedings Paper

Capabilities of existing optical laser pattern generator for large area micro images
Author(s): Manfred K. Stelter
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Paper Abstract

This paper addresses the materials, processes, and equipment required for large area micro pattern generation as used in the fabrication of display devices. We will point out some of the processing problems in obtaining zero defect patterns and the types of equipment available to obtain the desired result. We will define large area micro images as patterns generated on substrates larger than 8 by 8 inches, having geometries smaller than 0.008 inches.

Paper Details

Date Published: 18 August 1995
PDF: 9 pages
Proc. SPIE 2622, Optical Engineering Midwest '95, (18 August 1995); doi: 10.1117/12.216798
Show Author Affiliations
Manfred K. Stelter, Process Technologies Inc. (United States)

Published in SPIE Proceedings Vol. 2622:
Optical Engineering Midwest '95
Rudolph P. Guzik, Editor(s)

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