Proceedings Paper
Quality control of embedded-type phase-shift mask| Format | Member Price | Non-Member Price |
|---|---|---|
| $17.00 | $21.00 |
Paper Abstract
We have been developing the technology for phase shift masks since 1991 in order to
supply the reticles for 64 MDRAM generation and after. We are still developing both the
alternative and embedded types fori-line.
The embedded type is suitable for ASIC and contact hole. Now, we are reaching an
adequate supply of embedded type PSMs for practical use.
Currently the embedded types is relatively popular because the burden on designing is
small, the process is comparatively short, and defect repair is easier.
Paper Details
Date Published: 3 July 1995
PDF: 2 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212785
Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)
PDF: 2 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212785
Show Author Affiliations
Yoshiro Yamada, Toppan Printing Co., Ltd. (Japan)
Kazuaki Chiba, Toppan Printing Co., Ltd. (Japan)
Eisei Karikawa, Toppan Printing Co., Ltd. (Japan)
Hiromasa Unno, Toppan Printing Co., Ltd. (Japan)
Kazuaki Chiba, Toppan Printing Co., Ltd. (Japan)
Eisei Karikawa, Toppan Printing Co., Ltd. (Japan)
Hiromasa Unno, Toppan Printing Co., Ltd. (Japan)
Yasutaka Kikuchi, Toppan Printing Co., Ltd. (Japan)
Katsuhiro Kinemura, Toppan Printing Co., Ltd. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Katsuhiro Kinemura, Toppan Printing Co., Ltd. (Japan)
Masao Otaki, Toppan Printing Co., Ltd. (Japan)
Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)
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