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Proceedings Paper

Methods of error source identification and process optimization for photomask manufacturing
Author(s): Mark D. Cerio
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Paper Abstract

The optimization of a manufacturing process for linewidth uniformity is dependent on the ability to identify and eliminate the major sources of systematic error. When investigating a process composed of many individual sequential steps, it is necessary to decouple these steps and determine the relative magnitude of their contributions. Often, classical approaches in experimental design are either inappropriate or prohibitively expensive. Alternative statistical methods exist which provide sufficient accuracy of results with limited sample sizes and cost effectiveness.

Paper Details

Date Published: 3 July 1995
PDF: 11 pages
Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212766
Show Author Affiliations
Mark D. Cerio, DuPont Photomasks, Inc. (United States)

Published in SPIE Proceedings Vol. 2512:
Photomask and X-Ray Mask Technology II
Hideo Yoshihara, Editor(s)

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