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Proceedings Paper

New interferometric method for thin-film metrology
Author(s): Ludmila A. Gerasimova; Alexander O. Fedorov
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Paper Abstract

A new interferometric method for measuring thickness and refractive index of thin films on substrates without a priori information about these two parameters is presented. For measurements, the substrate is produced in the form of a wedge, with the investigated film only on a part of it. Two complex patterns of interference equal-thickness fringes are observed, produced by interference in a two-beam interferometer with the sample, and by interference of two beams reflected by the sample surfaces, each for two different wavelengths. The values of the thin film thickness and refractive index are calculated from the values of relative shifts of interference fringes between two parts of each interference pattern. The thickness of a thin film is measured with accuracy of 5 nm.

Paper Details

Date Published: 23 June 1995
PDF: 8 pages
Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); doi: 10.1117/12.212653
Show Author Affiliations
Ludmila A. Gerasimova, St. Petersburg Institute of Fine Mechanics and Optics (Russia)
Alexander O. Fedorov, S.I. Vavilov State Optical Institute (Russia)

Published in SPIE Proceedings Vol. 2545:
Interferometry VII: Applications
Ryszard J. Pryputniewicz; Gordon M. Brown; Werner P. O. Jueptner, Editor(s)

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