Proceedings Paper
Interferometric reflection moire| Format | Member Price | Non-Member Price |
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Paper Abstract
A new reflection moire technique is introduced in this paper. The basic equations that relate the measurement of slopes to the basic geometric and optical parameters of the system are derived. The sensitivity and accuracy of the method are discussed. Examples of application to the study of silicon wafers and electronic chips are given.
Paper Details
Date Published: 23 June 1995
PDF: 14 pages
Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); doi: 10.1117/12.212632
Published in SPIE Proceedings Vol. 2545:
Interferometry VII: Applications
Ryszard J. Pryputniewicz; Gordon M. Brown; Werner P. O. Jueptner, Editor(s)
PDF: 14 pages
Proc. SPIE 2545, Interferometry VII: Applications, (23 June 1995); doi: 10.1117/12.212632
Show Author Affiliations
Cesar A. Sciammarella, Illinois Institute of Technology (United States)
Olivier Combell, Illinois Institute of Technology (United States)
Published in SPIE Proceedings Vol. 2545:
Interferometry VII: Applications
Ryszard J. Pryputniewicz; Gordon M. Brown; Werner P. O. Jueptner, Editor(s)
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