Incorporation of organic salt additives consisting of an organic acid and organic base improves the resist stability. The sensitivity of a t-BOC resist without the salt decreased to 1/4 after standing for one hour after deep-UV exposure. Typical T-top patterns were obtained on this resist by a KrF excimer laser stepper (NA equals 0.45), and a half-micron resolution was barely obtained. On the other hand, a t-BOC resist, with an organic salt, consisting of p- toluenesulfonic acid and dicyclohexylamine (PTS/DCHA), showed no change in sensitivity after one hour. The resist with the PTS/DCHA achieved a 0.3-micrometers resolution line-and- space pattern without environmental control or a protective topcoat.

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210360

Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)