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Proceedings Paper

Study for the design of high-resolution novolak-DNQ photoresist: the effects of low-molecular-weight phenolic compounds on resist systems
Author(s): Hidetoshi Miyamoto; Toshio Nakamura; Katsumi Inomata; Toshiyuki Ota; Akira Tsuji
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Paper Abstract

Design criteria for the development of the high resolution photoresists comprising novolak resin and DNQ-PAC are proposed by studying the dissolution behavior of photoresists across film thickness. We propose a new analytical method for the dissolution behavior, with which the dissolution rate curves at surface, middle, and bottom parts in a photoresist film can be analyzed separately. From the experimental results obtained by using this new analytical method, we established the following design criteria: (1) To obtain a large separation DOF, the photoresist has to show a steep slope and a large contrast of dissolution curve at the bottom part in some practical exposure dose range of clear region. (2) A small difference of dissolution rate between the surface part and bottom part is necessary to obtain a large profile DOF. In order to adjust a dissolution behavior taking account of the new criteria, we examined the effects of photoresist components. It was found that some phenolic additives were very useful to control the dissolution behavior. The results of the spectroscopic study suggest that such a strong effect is caused by the interaction between phenolic additive and PAC or developer. A photoresist developed by adopting these design criteria for the dissolution behavior control shows wide DOF at 0.35 micrometers L&S with good pattern profile.

Paper Details

Date Published: 9 June 1995
PDF: 12 pages
Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210344
Show Author Affiliations
Hidetoshi Miyamoto, Japan Synthetic Rubber Co., Ltd. (Japan)
Toshio Nakamura, Japan Synthetic Rubber Co., Ltd. (Japan)
Katsumi Inomata, Japan Synthetic Rubber Co., Ltd. (Japan)
Toshiyuki Ota, Japan Synthetic Rubber Co., Ltd. (Japan)
Akira Tsuji, Japan Synthetic Rubber Co., Ltd. (Japan)

Published in SPIE Proceedings Vol. 2438:
Advances in Resist Technology and Processing XII
Robert D. Allen, Editor(s)

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