Share Email Print

Proceedings Paper

Latent image metrology for production wafer steppers
Author(s): Peter Dirksen; Walter de Laat; Henry J. L. Megens
Format Member Price Non-Member Price
PDF $17.00 $21.00

Paper Abstract

A new latent image metrology technique is discussed that determines best focus with a precision of (sigma) equals 20 nm. This technique uses the existing alignment system of an ASM-L wafer stepper and requires no hardware or software modifications. The user just needs a standard chrome reticle. It can operate for machine setup at the factory, but also in-process for fully automatic self calibration of focus and tilt. A typical measurement takes a few minutes.

Paper Details

Date Published: 26 May 1995
PDF: 11 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209297
Show Author Affiliations
Peter Dirksen, Philips Research Labs. (Netherlands)
Walter de Laat, Philips Research Labs. (Netherlands)
Henry J. L. Megens, ASM Lithography BV (Netherlands)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

© SPIE. Terms of Use
Back to Top
Sign in to read the full article
Create a free SPIE account to get access to
premium articles and original research
Forgot your username?