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Proceedings Paper

Comparison of scalar and vector modeling of image formation in photoresist
Author(s): Chris A. Mack; Ching-Bo Juang
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Paper Abstract

A comparison is made between several scalar models for the formation of an image in a photoresist film with differing approximations and a vector model. It was found that up to a numerical apertures of 0.7, a full scalar model showed no appreciable deviation from the vector mode. However, when several common assumptions were made to simplify the scalar model, significant errors resulted at a higher numerical apertures.

Paper Details

Date Published: 26 May 1995
PDF: 14 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209270
Show Author Affiliations
Chris A. Mack, FINLE Technologies, Inc. (United States)
Ching-Bo Juang, Univ. of Texas/Austin (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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