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Proceedings Paper

Improvement of the ArF laser for photolithography
Author(s): Alexander N. Novoselov; Boris A. Konstantinov; Victor G. Nikiforov; Boris F. Trinchuk
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Paper Abstract

With the aim of improving output parameters and operating characteristics of ArF excimer laser intended for submicrolithography intracavity Fabry-Perot etalons able to effectively narrow and tune laser radiation were developed and tested. Used in an YYE 1702 compact excimer laser two innovative etalons permitted to achieve maximum output energy of 5 mJ at 193,3 nm, bandwidth of 20 pm and 0.5 level for 8 ns pulse duration, 20 X 5 mm output beam aperture, 100 Hz pulse repetition rate. The dispersive resonator shows high energy efficiency.

Paper Details

Date Published: 26 May 1995
PDF: 3 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209248
Show Author Affiliations
Alexander N. Novoselov, Scientific Research Institute Zenit (Russia)
Boris A. Konstantinov, Scientific Research Institute Zenit (Russia)
Victor G. Nikiforov, Scientific Research Institute Zenit (Russia)
Boris F. Trinchuk, Scientific Research Institute Zenit (Russia)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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