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Proceedings Paper

UV radiometry issues for UV stabilization of photoresist
Author(s): Jianou Shi; Steven Paul Grindle; Sharine Chen; Greg Owen; Linda J. Insalaco; Christopher L. Cromer; Laurie S. Goldner
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Paper Abstract

The use of intense, broadband, ultraviolet (UV) radiation in the stabilization of photoresist requires stable UV sources and sensors, as well as suitable calibration procedures. We have constructed and measured the stability of a new UV transfer source standard with a spectrum that is identical to that of a commercially available photostabilizer. This device is particularly useful in calibrating the broadband UV detectors that monitor photostabilizer irradiance. The irradiance of this new source in a narrow band around 310 nm is monitored and found to be stable to better than 1.5% over 12 days. Spectral measurements of the source are also presented. The stability of two other commercially available UV sources is investigated and the behavior of the broadband UV sensors is discussed.

Paper Details

Date Published: 26 May 1995
PDF: 10 pages
Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209247
Show Author Affiliations
Jianou Shi, Fusion Semiconductor Systems (United States)
Steven Paul Grindle, Fusion Semiconductor Systems (United States)
Sharine Chen, Fusion Semiconductor Systems (United States)
Greg Owen, Fusion Semiconductor Systems (United States)
Linda J. Insalaco, Fusion Semiconductor Systems (United States)
Christopher L. Cromer, National Institute of Standards and Technology (United States)
Laurie S. Goldner, National Institute of Standards and Technology (United States)

Published in SPIE Proceedings Vol. 2440:
Optical/Laser Microlithography VIII
Timothy A. Brunner, Editor(s)

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