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Proceedings Paper

Conductivity and reproducibility of e-beam-induced deposited tungsten lines
Author(s): Klaus T. Kohlmann-von Platen; L. Schmidt; Wilhelm H. Bruenger
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Paper Abstract

The e-beam induced deposition process with the precusor gas W(CO)6 is investigated with the aim of improving the conductivity of the deposits. For this purpose, lines are deposited on KELVIN structures of gold on siliconoxide. A non-ohmic behavior is observed, if the connection of the deposits to the gold is incomplete. The reproducibility of the process mainly depends on the stability of the current density. Keeping the current density constant, the deviations of the conductivity are less than 20%. By increasing the dwell time and by lowering the beam energy and the beam step size (BSS), the specific resistance decreases down to 10-3 (Omega) cm. We conjecture that at a beam energy of 1 keV and a current density of 60-70 A/cm2 the conductivity and the reproducibility might further be improved.

Paper Details

Date Published: 19 May 1995
PDF: 9 pages
Proc. SPIE 2437, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V, (19 May 1995); doi: 10.1117/12.209159
Show Author Affiliations
Klaus T. Kohlmann-von Platen, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
L. Schmidt, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)
Wilhelm H. Bruenger, Fraunhofer-Institut fuer Siliziumtechnologie (Germany)

Published in SPIE Proceedings Vol. 2437:
Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V
John M. Warlaumont, Editor(s)

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