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Proceedings Paper

Cross-sectional imaging of directed self-assembly block copolymers
Author(s): Kye Okabe; He Yi; Maryann Tung; Richard Tiberio; Joost Bekaert; Roel Gronheid; H.-S. Philip Wong
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Paper Abstract

In this paper we address an important topic for the development of block copolymer directed self assembly, which is the lack of the third dimensional information. The three-dimensional shape of the DSA feature directly impacts the ability to transfer the DSA pattern into etched patterns. Through TEM sample preparation by in-situ focused ion beam (FIB) Pt deposition and milling, we show cross-sectional images for the two most elemental building blocks of directed self assembled block copolymers, namely, the single and double-hole (peanut shape) etched in Si structures with great contrast at the interface formed by PS and PMMA. Additionally, a hard-mask single hole structure processed with a different template material is shown as well. Elemental mapping with energy filtered TEM (EFTEM) was shown to assist interpretation of images. 3D reconstruction of the holes formed in the hard-mask sample was performed using dark field (DF) STEM. A reduction in the SOC and SOG thickness was observed post in-situ Pt deposition for the hard mask structure. Further TEM sample preparation improvements will be needed to minimize the compression observed.

Paper Details

Date Published: 19 March 2015
PDF: 9 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942318 (19 March 2015); doi: 10.1117/12.2087569
Show Author Affiliations
Kye Okabe, Stanford Univ. (United States)
He Yi, Stanford Univ. (United States)
Maryann Tung, Stanford Univ. (United States)
Richard Tiberio, Stanford Univ. (United States)
Joost Bekaert, IMEC (Belgium)
Roel Gronheid, IMEC (Belgium)
H.-S. Philip Wong, Stanford Univ. (United States)

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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