In this paper, we investigate an electric-field assisted assembly approach to create dense arrays of contact hole patterns with complex feature geometries. This hybrid strategy uses a spatially varying dielectrophoretic (DEP) force created by lithographically defined guiding features to assemble dense arrays of nanoparticles within the features, thereby replicating features within the starting pattern. For close-packed particle arrays, the half- and full-pitch of the contact hole array is defined by the starting nanoparticle core and shell diameter.

Date Published: 19 March 2015
PDF: 6 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94231U (19 March 2015); doi: 10.1117/12.2087547

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)