Proceedings Paper
Polarization aberration compensation method by adjusting illumination partial coherent factors in immersion lithography| Format | Member Price | Non-Member Price |
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Paper Abstract
As the numerical aperture (NA) increasing and process factor k1 decreasing in 193nm immersion lithography, polarization aberration (PA) of projection optics leads to image quality degradation seriously. Therefore, this work proposes a new scheme for compensating polarization aberration. By simulating we found that adjusting the illumination source partial coherent factors σout is an effective method for decreasing the PA induced pattern critical dimension (CD) error while keeping placement error (PE) within an acceptable range. Our simulation results reveal that the proposed method can effectively compensate large PA in actual optics.
Paper Details
Date Published: 13 November 2014
PDF: 8 pages
Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92770Z (13 November 2014); doi: 10.1117/12.2087529
Published in SPIE Proceedings Vol. 9277:
Nanophotonics and Micro/Nano Optics II
Zhiping Zhou; Kazumi Wada, Editor(s)
PDF: 8 pages
Proc. SPIE 9277, Nanophotonics and Micro/Nano Optics II, 92770Z (13 November 2014); doi: 10.1117/12.2087529
Show Author Affiliations
Yue Jia, Beijing Institute of Technology (China)
Yanqiu Li, Beijing Institute of Technology (China)
Lihui Liu, Beijing Institute of Technology (China)
Yanqiu Li, Beijing Institute of Technology (China)
Lihui Liu, Beijing Institute of Technology (China)
Chunying Han, Beijing Institute of Technology (China)
Xiaolin Liu, Beijing Institute of Technology (China)
Xiaolin Liu, Beijing Institute of Technology (China)
Published in SPIE Proceedings Vol. 9277:
Nanophotonics and Micro/Nano Optics II
Zhiping Zhou; Kazumi Wada, Editor(s)
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