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Proceedings Paper

Development of a comprehensive metrology platform dedicated to dimensional measurements of CD atomic force microscopy tips
Author(s): Johann Foucher; Sebastian W. Schmidt; Aurelien Labrosse; Alexandre Dervillé; Sandra Bos; Sebastian Schade; Bernd Irmer
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Paper Abstract

In this paper, we present our most recent approach on the extraction of reliable atomic force microscopy (AFM) tip dimensions from scanning electron microscopy (SEM) images in order to answer future requirements on ever shrinking CD AFM tips. We demonstrate the capabilities of a newly developed, fully automatic analysis software based on advanced SEM image modeling and user a-priori knowledge integration in SEM image analysis algorithm. The impact of such breakthrough technology will be shown as a function of its stability and robustness by varying tip shape, imaging settings, and SEM setup parameters. The extracted values are compared to data yielded from a commonly used SEM image analysis approach based on threshold type algorithms, and directly related to reference CD AFM measurements. We will discuss the prospective challenges accompanied with shrinking tip dimensions and the potential of a comprehensive data fusion approach, which can be used for both R&D and high volume production.

Paper Details

Date Published: 19 March 2015
PDF: 9 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240S (19 March 2015); doi: 10.1117/12.2085977
Show Author Affiliations
Johann Foucher, Pollen Technology SAS (France)
Sebastian W. Schmidt, nanotools GmbH (Germany)
Aurelien Labrosse, Pollen Technology SAS (France)
Alexandre Dervillé, Pollen Technology SAS (France)
Sandra Bos, CEA-LETI (France)
Sebastian Schade, nanotools GmbH (Germany)
Bernd Irmer, nanotools GmbH (Germany)

Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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