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Proceedings Paper

Molecular glass resist performance for nano-pattern transfer
Author(s): Ziad el Otell; Andreas Ringk; Tristan Kolb; Christian Neuber; Leander Hansel; Jean-François de Marneffe
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Paper Abstract

The performance of novel molecular glass resists is demonstrated in this work for the purposes of performing nano-pattern transfer. In order to improve the etch durability, post apply bake (PAB) and mixing two resists platforms were investigated. These resists showed a promising etch durability for efficient pattern transfer with films as thin as 5 nm. Etch rate, surface roughness, evolution of the refractive index of these materials are presented to establish a good baseline and select appropriate candidate materials for patterning beyond-CMOS.

Paper Details

Date Published: 17 March 2015
PDF: 7 pages
Proc. SPIE 9428, Advanced Etch Technology for Nanopatterning IV, 94280J (17 March 2015); doi: 10.1117/12.2085828
Show Author Affiliations
Ziad el Otell, IMEC (Belgium)
Katholieke Univ. Leuven (Belgium)
Andreas Ringk, Univ. Bayreuth (Germany)
Tristan Kolb, Univ. Bayreuth (Germany)
Christian Neuber, Univ. Bayreuth (Germany)
Leander Hansel, IMEC (Belgium)
Jean-François de Marneffe, IMEC (Belgium)

Published in SPIE Proceedings Vol. 9428:
Advanced Etch Technology for Nanopatterning IV
Qinghuang Lin; Sebastian U. Engelmann; Ying Zhang, Editor(s)

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