Multiphoton absorption polymerization uses nonlinear absorption of laser light to expose a negative-tone photoresist locally, creating three-dimensional structures that can have feature sizes on the sub-100 nm scale. The resolution can be further improved using schemes in which a second beam of light prevents exposure of the photoresist. However, the feature pitch that can be achieved by two-color schemes is limited by the inability to deactivate the photoresist completely. One solution to this problem is to develop a method that instead employs three laser beams. Here we discuss the potential advantages of three-color lithographic schemes and demonstrate new materials that pave the way towards the demonstration of three-color lithography.

Date Published: 16 March 2015
PDF: 6 pages
Proc. SPIE 9353, Laser 3D Manufacturing II, 935312 (16 March 2015); doi: 10.1117/12.2084451

Published in SPIE Proceedings Vol. 9353:
Laser 3D Manufacturing II
Henry Helvajian; Alberto Piqué; Martin Wegener; Bo Gu, Editor(s)